Methods for selective deposition of graded materials on continuously fed objects

US7976899B2 · kind B2 · utility

Assignee

• General Electric Company · US

Inventors

• Min Yan · Ballston Lake, US
• Ahmet Gun Erlat · Clifton Park, US
• Paul Alan McConnelee · Albany, US
• Anil Raj Duggal · Niskayuna, US
• Svetlana Rogojevic · Niskayuna, US

Key dates

• Filing date: Oct 23, 2006
• Grant date: Jul 12, 2011
• Expiry date: Sep 18, 2029

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/545
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments of the invention include a selective deposition method that allows for coating of selective portions of an object, such as an electronic device, and inhibits coating of other selective portions of the object, such as the electric contacts. The selective deposition method includes providing a web to transport the object through a deposition chamber. The web may include and reference mechanisms to register the object relative to the web. The method further includes providing deposition material and a shadow mask that has open spaces in it to inhibit coating selective portions of the object. The deposition material serves as the coating material.