Method for deposition of titanium oxide by a plasma source
US7976909B2 · kind B2 · utility
8Cited by
4References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 30, 2004 |
| Grant date | Jul 12, 2011 |
| Priority date | — |
| Expiry date | Jul 6, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T50/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Process for depositing, on a substrate, a coating based on titanium oxide, which is characterized in that the coating with photocatalytic properties is deposited by chemical vapor deposition, especially from a gas mixture comprising at least one organometallic precursor and/or a metal halide of said metal oxide, the deposition being enhanced by a plasma source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.