Patent · US Active

Supplying RF power to a plasma process

US7981306B2 · kind B2 · utility

7Cited by

20References

14Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Manfred Blattner · Emmendingen, DE
Markus Winterhalter · Bad Krozingen, DE
Ekkehard Mann · Gundelfingen, DE

Key dates

Filing date	Aug 11, 2006
Grant date	Jul 19, 2011
Priority date	—
Expiry date	Nov 18, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/0206
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.