Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same
US7981594B2 · kind B2 · utility
13Cited by
2References
12Claims
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Key dates
| Filing date | Jun 5, 2008 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | Dec 19, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formula 1, 2 and 3:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.