Method for enhancing optical characteristics of multilayer optoelectronic components
US7981707B2 · kind B2 · utility
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21References
21Claims
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Key dates
| Filing date | Dec 17, 2002 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | May 29, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The method of the invention consists of implanting ions into the surface of multilayer optical waveguides, in the highly doped layer, in a defined pattern so as to modify the refractive index of this layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.