Patent · US Active

Photopolymer-based dielectric materials and methods of preparation and use thereof

US7981989B2 · kind B2 · utility

23Cited by
8References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 28, 2007
Grant dateJul 19, 2011
Priority date—
Expiry dateMay 3, 2029

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08F220/10
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Photopolymer-based dielectric materials are provided with methods for preparing the same. Composites and electronic devices including such dielectric materials also are provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.