Method for analyzing reflection properties
US7983788B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2008 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | Jul 19, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/55
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method allows analyzing and describing the reflective properties of a three-dimensionally structured original surface. The topology of the original surface is determined and the topological data are stored in the form of a depth map in a first data record and evaluated with respect to the influence of the data on the reflective properties. Each surface element is assigned a reflective value in accordance with the evaluation and the value is stored in a second data record and made available to other machining or inspection systems. There, the reflection values of the second data record are divided into classes and the depth values of the first data record, assigned to the classified reflection values, are varied in accordance with the classification. Finally, the changed depth values are employed as parameters for electronically controlling a tool in order to machine the artificially produced surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.