Optical device and method of manufacturing the same
US7985294B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 3, 2006 |
| Grant date | Jul 26, 2011 |
| Priority date | — |
| Expiry date | Mar 3, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/1342
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical device and a method of manufacturing the optical device, with the method including the steps of forming a dopant layer on a stoichiometric lithium niobate single crystal substrate with Li to Nb mole composition ratio of 49.5% to 50.5%, and diffusing a dopant in the dopant layer into at least a portion of the stoichiometric lithium niobate single crystal substrate. The stoichiometric lithium niobate single crystal substrate includes 0.5 to 5 mol % of Mg. In the diffusing step, a heat treatment is performed at a diffusion temperature of 1000° C. to 1200° C. for a diffusion time of 3 hours to 24 hours in a dry atmosphere of at least one of O2, N2, Ar and He gas having a dew-point temperature of −35° C. or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.