Method for manufacturing integrated MEMS resonator device
US7985611B1 · kind B1 · utility
3Cited by
3References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2010 |
| Grant date | Jul 26, 2011 |
| Priority date | — |
| Expiry date | Dec 7, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0742
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
The present invention provides a method for manufacturing a micro-electro-mechanical system (MEMS) resonator device using the same device layer, dielectric layer, and conductive layer that is used to create other electrical devices in a complementary metal oxide semiconductor (CMOS) process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.