Patent · US Active

Fluorinated sulfonamide surfactants for aqueous cleaning solutions

US7985723B2 · kind B2 · utility

12Cited by

19References

21Claims

0Family size

Assignee

3M INNOVATIVE PROPERTIES COMPANY · US

Inventors

Patricia M. Savu · Ramsey, US
William M. Lamanna · Stillwater, US
Michael J. Parent · Oakdale, US

Key dates

Filing date	Aug 30, 2010
Grant date	Jul 26, 2011
Priority date	—
Expiry date	Aug 30, 2030

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/22
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.