Illumination system
US7988339B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2009 |
| Grant date | Aug 2, 2011 |
| Priority date | — |
| Expiry date | Mar 5, 2030 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF21Y2115/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An illumination system includes at least one illumination module and a mechanism. The illumination module includes a light source generating a light beam, a first reflector, in which the light source is positioned, including a first reflective surface to reflect the light beam to form a first beam, and a second reflector including a second reflective surface reflecting the light beam and the first beam to form a second beam and a third beam, wherein the second and third beams combine to generate a projection pattern. The mechanism adjusts the position of the second reflector relative to the light source to change the projection pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.