Adhesion of membranes on nitride layer in electrochemical sensors by attachment to underlying oxide layer
US7988838B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2006 |
| Grant date | Aug 2, 2011 |
| Priority date | — |
| Expiry date | Sep 10, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/333
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electrochemical sensor is provided that exhibits improved adhesion of the membrane to the nitride layer used as an insulating layer in silicon- or silicon-oxide-based electrochemical sensing devices. The sensing devices include a substrate, an oxide disposed on the substrate, a nitride disposed on the oxide, an electrically conductive structure disposed on the oxide layer, and an electrode disposed on the oxide layer and electrically coupled to the electrically conductive structure. At least one opening is formed in the nitride layer to form at least one adhesion trench that exposes a surface region of an oxide layer underlying the nitride layer. The membrane covers the electrode, and contacts the oxide surface regions exposed by the adhesion trenches. The contact between the membrane and the oxide surface region provides for improved adhesion of the membrane to the electrochemical sensing device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.