Photoresist composition and method of forming a photoresist pattern using the same
US7989136B2 · kind B2 · utility
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5References
12Claims
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Key dates
| Filing date | Mar 31, 2008 |
| Grant date | Aug 2, 2011 |
| Priority date | — |
| Expiry date | Jan 5, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/128
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.