Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof
US7989154B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 2006 |
| Grant date | Aug 2, 2011 |
| Priority date | — |
| Expiry date | May 12, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.