Liquid applicator and method for reducing the concentration of by-products from antiseptic
US7993066B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 2010 |
| Grant date | Aug 9, 2011 |
| Priority date | — |
| Expiry date | May 18, 2030 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA45D2200/1018
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An applicator for reducing the concentration of unwanted chemicals such as para-chloroaniline (PCA) from an antiseptic solution includes an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and at least one hydrophobic or hydrophilic material. The hydrophobic or hydrophilic material selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the hydrophobic or hydrophilic material. A method for selectively removing unwanted by-products from an antiseptic solution includes the steps of providing an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and contacting the antiseptic solution with at least one hydrophobic or hydrophilic material that selectively removes the unwanted by-products from the antiseptic solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.