Patent · US Active

Method for preparing by thermal spraying a silicon-and zirconium-based target

US7993503B2 · kind B2 · utility

2Cited by

16References

14Claims

0Family size

Assignee

SAINT-GOBAIN GLASS FRANCE · FR

Inventors

Nicolas Nadaud · Paris, FR
Dominique Billieres · Le Pontet, FR

Key dates

Filing date	Feb 3, 2006
Grant date	Aug 9, 2011
Priority date	—
Expiry date	Apr 12, 2028

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/2982
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Method of producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound based on atoms of different types chosen especially from the constituents M belonging to the (Zr, Mo, Ti, Nb, Ta, Hf, Cr) family and silicon, characterized in that at least one fraction of said compound, the constituents of which are bonded by covalent and/or ionic and/or metallic bonds, is injected into a plasma jet, said plasma jet spraying the constituents of said compound onto the target so as to deposit a coating of said compound on a surface portion of said target.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.