Method for operating a plasma process and arc discharge detection device
US7995313B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 23, 2007 |
| Grant date | Aug 9, 2011 |
| Priority date | — |
| Expiry date | Jun 8, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An arc discharge in a plasma process is detected using a method that includes detecting arc discharges by monitoring one or more characteristic values of the plasma process, and comparing at least a first characteristic value with a predefinable first threshold value (SW1). When it is determined that the at least first characteristic value reaches the first threshold value, a potential arc discharge is recognized and a first countermeasure is triggered to suppress the arc discharge. The method includes comparing at least a second characteristic value with a pre-definable second threshold value (SW2) that differs from the first threshold value, and when it is determined that the second characteristic value reaches the second threshold value, triggering a second countermeasure for suppressing the arc discharge. After the second countermeasure has been triggered, a renewed triggering of the second countermeasure is prevented during a blocking time (Tt).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.