Patent · US Active

Method for direct fabrication of nanostructures

US7998528B2 · kind B2 · utility

3Cited by
9References
41Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 14, 2003
Grant dateAug 16, 2011
Priority date
Expiry dateFeb 27, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/86
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An all-additive method for direct fabrication of nanometer-scale planar and multilayer structures comprises the steps of acquiring a transferable material with a submillimeter-scale tip, depositing at least a portion of the acquired first transferable material at a predetermined location onto a substrate without a bridging medium, and repeating to create a structure using the transferable material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.