Method of fabricating a magnetic stack design with decreased substrate stress
US7998758B2 · kind B2 · utility
5Cited by
4References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2009 |
| Grant date | Aug 16, 2011 |
| Priority date | — |
| Expiry date | Dec 6, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/161
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A magnetic element and a method for making a magnetic element. The method includes patterning a first electrode material to form a first electrode on a substrate and depositing filler material on the substrate around the first electrode. The method further includes polishing to form a planar surface of filler and the first electrode. A magnetic cell is formed on the planar surface and a second electrode is formed on the magnetic cell. In some embodiments, the first electrode has an area that is at least 2:1 to the area of the magnetic cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.