Patent · US Active

High efficiency solar cell fabrication

US7998863B2 · kind B2 · utility

8Cited by
9References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 22, 2008
Grant dateAug 16, 2011
Priority date
Expiry dateAug 28, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of forming a contact structure and a contact structure so formed is described. The structure contacts an underlying layer of a semiconductor junction, wherein the junction comprises the underlying layer of a semiconductor material and is separated from an overlying layer of semiconductor material by creating an undercut region to shade subsequent metal formation. Various steps are performed using inkjet printing techniques.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.