Plasma spraying device and a method for introducing a liquid precursor into a plasma gas stream
US8001927B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 19, 2007 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | Nov 29, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0346
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to a plasma spraying device (1) for spraying a coating (2) onto a substrate (3) by a thermal spray process. Said plasma spraying device (1) includes a plasma torch (4) for heating up a plasma gas (5) in a heating zone (6), wherein the plasma torch (4) includes a nozzle body (7) for forming a plasma gas stream (8), and said plasma torch (4) has an aperture (9) running along a central longitudinal axis (10) through said nozzle body (7). The aperture (9) has an convergent section (11) with an inlet (12) for the plasma gas (5), a throat section (13) including a minimum cross-sectional area of the aperture, and a divergent section (14) with an outlet (15) for the plasma gas stream (8), wherein an introducing duct (16) is provided for introducing a liquid precursor (17) into the plasma gas stream (8). According to the invention a penetration means (18, 161, 181, 182) is provided to penetrate the liquid precursor (17) inside the plasma gas stream (8). The invention relates also to a method for introducing a liquid precursor (17) into a plasma gas stream (8) as well as to the use of a plasma spraying device (1) and a method in accordance with the present invention for…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.