Patent · US Active

Forming method for polymeric laminated wafers comprising different film materials

US8002935B2 · kind B2 · utility

2Cited by
182References
7Claims
0Family size

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Inventor

Key dates

Filing dateMar 6, 2006
Grant dateAug 23, 2011
Priority date
Expiry dateJul 11, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24628
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method of making a polymeric laminated wafer comprising different film materials that are softenable and formable at different softening temperatures corresponding with the film materials. Also disclosed is a laminated wafer wherein a first layer has different thermal properties than a second layer of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.