Process and apparatus for purifying silicon tetrachloride or germanium tetrachloride containing hydrogen compounds

US8002954B2 · kind B2 · utility

Assignee

• EVONIK DEGUSSA GMBH · DE

Inventors

• Hanns-Peter Popp · Starnberg, DE
• Rainer Nicolai · Haßloch, DE
• Hartwig Rauleder · Rheinfelden (Baden), DE
• Jurgen Lang · Ludwigsburg, DE

Key dates

• Filing date: Jun 10, 2005
• Grant date: Aug 23, 2011
• Expiry date: Dec 6, 2027

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01J2219/0896
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (4.1 or 5.1) which is connected via a connecting line with the inlet of the reactor (4.3 or 5.3) with control unit (4.4 or 5.4) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor (5.5) to a condensation unit (4.5 or 5.11) with downstream collection vessel (4.6 or 5.12) which is connected via an offtake line (4.6.2 or 5.12.1) to a distillation unit (4.8 or 5.13) and, if appropriate, is equipped with a feed line (4.6.1) to the unit (4.1).