Deposition method for nanostructure materials

US8002958B2 · kind B2 · utility

Assignees

• The University of North Carolina at Chapel Hill · US
• XINTEK, INC. · US

Inventors

• Otto Z. Zhou · Chapel Hill, US
• Bo Gao · Lo Wu, CN
• Guozhen Yue · Carrboro, US
• Soojin Oh · Carrboro, US

Key dates

• Filing date: Nov 4, 2005
• Grant date: Aug 23, 2011
• Expiry date: Jul 30, 2029

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C25D13/00
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for depositing a coating of a nanostructure material onto a substrate includes: (1) forming a solution or suspension of containing the nanostructure material; (2) selectively adding “chargers” to the solution; (3) immersing electrodes in the solution, the substrate upon which the nanostructure material is to be deposited acting as one of the electrodes; (4) applying a direct and/or alternating current electrical field between the two electrodes for a certain period of time thereby causing the nanostructure materials in the solution to migrate toward and attach themselves to the substrate electrode; and (5) subsequent optional processing of the coated substrate.