Method of producing a slab type two-dimensional photonic crystal structure
US8002998B2 · kind B2 · utility
3Cited by
3References
5Claims
0Family size
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Key dates
| Filing date | Aug 21, 2007 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | May 31, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A first main face of a substrate of a dielectric single crystal is etched to form recesses in the substrate. A second main face of the substrate is mechanically processed to form a slab, so that the recesses pass through the substrate to form through holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.