System and a method for improved crosshatch nanomachining of small high aspect three dimensional structures by creating alternating superficial surface channels
US8003283B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Jun 18, 2009 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | Nov 5, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T83/05
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it works the material. Therefore, embodiments of the present invention minimizes tip deflection errors allowing allow high aspect Nano-bits to reliably and accurately nanomachine small high aspect three dimensional structures to repair and rejuvenate photomasks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.