Metal alkoxide compound, material for forming thin film, and method for producing thin film
US8003814B2 · kind B2 · utility
2Cited by
1References
6Claims
0Family size
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Key dates
| Filing date | Sep 12, 2007 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | Jun 22, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F7/003
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A metal alkoxide compound represented by the following general formula (1),wherein each of R1 to R8 is independently a hydrogen atom or a methyl group; M is a titanium, a zirconium or a hafnium atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.