Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device
US8004028B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2009 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | Jun 6, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8063
Abstract
A solid state imaging device including photoelectric conversion devices which are arranged two-dimensionally; a color filter including a plurality of picture elements, each disposed corresponding to each of the photoelectric conversion devices; and a plurality of transfer lenses each disposed corresponding to each of the picture elements, formed of a thermoset acrylic resin, and formed directly on each of the picture elements, wherein a gap between neighboring transfer lenses is not more than 0.035 μm, and a contact length between neighboring transfer lenses is within the range of 3-80% of the pitch of the plurality of transfer lenses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.