Patent · US Active

Wafer level alignment structures using subwavelength grating polarizers

US8004678B2 · kind B2 · utility

6Cited by

0References

14Claims

0Family size

Assignee

Intel Corporation · US

Inventors

Martin Weiss · Margertshausen, DE
Brian Kinnear · Hillsboro, US
Telly Koffas · Beaverton, US
David Fryer · Hillsboro, US
Ming-Chuan Yang · Meridian, US
William T. BLANTON · Hillsboro, US

Key dates

Filing date	Jun 26, 2007
Grant date	Aug 23, 2011
Priority date	—
Expiry date	Jan 22, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7065
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In one embodiment, a wafer alignment system, comprises a radiation source to generate radiation, a radiation directing assembly to direct at least a portion of the radiation onto a surface of a wafer, the radiation having a polarization state, an optical analyzer to collect at least a portion of the radiation reflected from the wafer, the wafer including at least a first region having a first grating pattern oriented in a first direction and at least a second region having a second grating pattern oriented in a second direction, different from the first direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.