Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
US8006639B2 · kind B2 · utility
8Cited by
9References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 2006 |
| Grant date | Aug 30, 2011 |
| Priority date | — |
| Expiry date | May 9, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/44
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.