Clean fluid systems for partial monolayer fracturing
US8006760B2 · kind B2 · utility
43Cited by
310References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2008 |
| Grant date | Aug 30, 2011 |
| Priority date | — |
| Expiry date | Jun 21, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K8/805
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided are methods that include a method comprising: placing a clean fluid comprising proppant particulates into a portion of a fracture in a subterranean formation, and depositing one or more of the proppant particulates into the fracture to form a partial monolayer. In another aspect, the invention provides methods that include placing a degradable fluid loss additive comprising collagen into a subterranean formation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.