Patent · US Active

Method of detecting arc discharges in a plasma process

US8007641B2 · kind B2 · utility

3Cited by

44References

12Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Markus Winterhalter · Bad Krozingen, DE
Peter Wiedemuth · Herbolzheim, DE

Key dates

Filing date	Sep 22, 2006
Grant date	Aug 30, 2011
Priority date	—
Expiry date	May 5, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/0206
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator to which an instantaneous signal and a reference value are supplied. The reference value is formed by a setting means from an extreme value of the signal. The extreme value is determined by an extreme value detection device within a predetermined time period, and the comparator changes the state of an arc discharge detection signal when the comparison between the reference value and an instantaneous value of the signal shows that an arc discharge has occurred.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.