Aqueous cerium oxide dispersion

US8008201B2 · kind B2 · utility

Assignee

• EVONIK DEGUSSA GMBH · DE

Inventors

• Michael Kröll · Nagold, DE
• Stefan Heberer · Gelnhausen, DE
• Stipan Katusic · Bad Soden, DE
• Michael Kramer · Muscatine, US
• Wolfgang Lortz · Wächtersbach, DE

Key dates

• Filing date: Mar 8, 2006
• Grant date: Aug 30, 2011
• Expiry date: Apr 1, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/31053
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Aqueous cerium oxide dispersion Aqueous cerium oxide dispersion, containing 5 to 60% by weight cerium oxide. It can be used to polish SiO2 in the semiconductor industry.