Patent · US Active

System for processing an object

US8008639B2 · kind B2 · utility

0Cited by

8References

28Claims

0Family size

Assignee

Carl Zeiss NTS GmbH · US

Inventors

Wolfram Buhler · Hermaringen, DE
Alexander Rosenthal · Kempen, DE
Camille Stebler · Fehren, CH
Emmerich Bertagnolli · Munich, DE
Heinz Wanzenbock · Wien, AT

Key dates

Filing date	Nov 11, 2008
Grant date	Aug 30, 2011
Priority date	—
Expiry date	Nov 2, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31744
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of material at the surface. The gas supply apparatus is formed from a stack of plates providing a gas conduit system between at least one gas inlet and at least one gas outlet.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.