Optical system and method for use in projection systems
US8009358B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2004 |
| Grant date | Aug 30, 2011 |
| Priority date | — |
| Expiry date | Jun 8, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/4025
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system and method are presented to produce a desired illuminating light pattern. The system comprises a light source system configured and operable to produce structured light in the form of a plurality of spatially separated light beams; and a beam shaping arrangement. The beam shaping arrangement is configured as a diffractive optical unit configured and operable to carry out at least one of the following: (i) combining an array of the spatially separated light beams into a single light beam thereby significantly increasing intensity of the illuminating light; (ii) affecting intensity profile of the light beam to provide the illuminating light of a substantially rectangular uniform intensity profile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.