Method in creating a symbol pattern, symbol pattern obtained thereby, method and system for finding a position in such symbol pattern and computer program product for performing the method
US8015227B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2005 |
| Grant date | Sep 6, 2011 |
| Priority date | — |
| Expiry date | Jan 19, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V30/142
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The invention relates to a method in creating a two-dimensional symbol pattern which may be utilized to determine a position in a large area covered by the pattern, for example for recording handwritten information by means of a pen-like instrument. The invention is useful for creating a symbol pattern having desired properties, namely that any sufficiently large observed part of the pattern is unique, enabling an unambiguous determination of position. The symbol pattern is based on a non-repeating sequence of symbol values Sk that each corresponds to a fixed linear combination of the coefficients of the monomials in xk mod P(x), where P(x) is any polynomial of degree n in the field Fq. The symbol pattern is generated by folding the sequence according to a wrapping scheme. The invention also relates to methods and systems for finding the position of a group of observed symbol values in this symbol pattern and computer program products performing the methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.