Patent · US Active

Method of measuring deposition onto a substrate

US8015860B2 · kind B2 · utility

0Cited by
1References
9Claims
0Family size

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Key dates

Filing dateJun 24, 2008
Grant dateSep 13, 2011
Priority date
Expiry dateNov 30, 2029

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N33/15
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method of measuring the deposition of a composition onto a substrate. This information can be used to correlate how the composition will deposit on sanitary ware, such as shower cubicles, baths, and wash basins. The composition can be a liquid personal cleansing composition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.