Gaseous effluent treatment apparatus
US8016271B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2005 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Mar 12, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/0216
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.