Patent · US Active

Device for gas separation and method for producing such a system

US8016924B2 · kind B2 · utility

1Cited by

8References

10Claims

0Family size

Assignee

Forschungszentrum Jülich GmbH · DE

Inventors

Wilhelm Albert Meulenberg · Vaals, NL
Ralf Hansch · Bad Neuenahr-Ahrweiler, DE
Hans Peter Buchkremer · Heinsberg, DE
Detlev Stover · Niederzier, DE

Key dates

Filing date	Aug 13, 2005
Grant date	Sep 13, 2011
Priority date	—
Expiry date	Feb 9, 2028

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24998
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A system for gas separation has a mechanically stable metallic substrate layer having a pair of opposite faces and formed throughout with open pores. Respective functional layers laminated on each of the faces are composed of TiO2 or ZrO2. These functional layers are formed throughout with pores having an average pore diameter of less than 1 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.