Process and apparatus for forming nanoparticles using radiofrequency plasmas

US8016944B2 · kind B2 · utility

Assignee

• Regents of the University of Minnesota · US

Inventors

• Uwe Kortshagen · Roseville, US
• Elijah J. Thimsen · Minneapolis, US
• Lorenzo Mangolini · Yorba Linda, US
• Ameya Devendra Bapat · Kanchinakote, IN
• David Jurbergs · Fort Worth, US

Key dates

• Filing date: Nov 3, 2008
• Grant date: Sep 13, 2011
• Expiry date: Jan 21, 2029

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T117/108
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

Methods and apparatus for producing nanoparticles, including single-crystal semiconductor nanoparticles, are provided. The methods include the step of generating a constricted radiofrequency plasma in the presence of a precursor gas containing precursor molecules to form nanoparticles. Single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles, having diameters of no more than 10 nm may be fabricated in accordance with the methods.