Method for continual preparation of polycrystalline silicon using a fluidized bed reactor
US8017024B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2007 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Apr 18, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/029
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
There is provided a method for continual preparation of granular polycrystalline silicon using a fluidized bed reactor, enabling a stable, long-term operation of the reactor by effective removal of silicon deposit accumulated on the inner wall of the reactor tube. The method comprises (i) a silicon particle preparation step, wherein silicon deposition occurs on the surface of the silicon particles, while silicon deposit is accumulated on the inner wall of the reactor tube encompassing the reaction zone; (ii) a silicon particle partial discharging step, wherein a part of the silicon particles remaining inside the reactor tube is discharged out of the fluidized bed reactor so that the height of the bed of the silicon particles does not exceed the height of the reaction gas outlet; and (iii) a silicon deposit removal step, wherein the silicon deposit is removed by supplying an etching gas into the reaction zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.