Micro and nano structures in an elastomeric material
US8017218B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2006 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Sep 16, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/2575
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The invention relates to an elastomeric device (105), wherein the elastomeric device contains a relief structure with indentations with respect to the base (110), (102) and wherein selected ones of said indentations comprise at least two indentation depths (112), (108) and indentation widths (101), (107). It also relates to a method of making a master for construction of said elastomeric device comprising a procedure to provide a pattern on a substrate of a suitable material. One step in. the construction of said elastomeric device comprises a molding procedure of an elastomer. Methods of using the elastomeric device in printing, fluidic control, sorting, lab-on-a-chip devices are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.