Self cleaning aluminum alloy substrates
US8017247B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2007 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Jun 14, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249956
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Self-cleaning aluminum alloy substrates and methods of making the same are disclosed. In one embodiment, a substrate is provided, the substrate including an aluminum alloy body, an anodic oxide zone having micropores within a surface of the aluminum alloy body, the anodic oxide zone being substantially impermeable to contaminants, and a photocatalytic film located on at least a portion of the anodic oxide zone, wherein the photocatalytic film comprises photocatalytically active semiconductor. In one embodiment, a method is provided, the method including the steps of forming an anodic oxide zone in at least a portion of an aluminum alloy base, forming a photocatalytic film, the photocatalytic film being located on the anodic oxide zone, and sealing the anodic oxide zone with a sealant, wherein, as sealed, the anodic oxide zone is substantially impermeable to contaminants.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.