Substrate preparation for thin film solar cell manufacturing
US8017861B2 · kind B2 · utility
5Cited by
4References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 18, 2008 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Jun 28, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A thin film solar cell including a Group IBIIIAVIA absorber layer on a defect free base including a stainless steel substrate is provided. The stainless steel substrate of the base is surface treated to reduce the surface roughness such as protrusions that cause shunts. In one embodiment, the surface roughness is reduced by coating surface with a thin silicon dioxide which fills the cavities and recesses around the protrusions and thereby reducing the surface roughness. After the silicon dioxide film is formed, a contact layer is formed over the ruthenium layer and the exposed portions of the substrate to complete the base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.