Patent · US Active

Continual flow pin washer

US8020571B2 · kind B2 · utility

3Cited by
12References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 16, 2008
Grant dateSep 20, 2011
Priority date
Expiry dateDec 5, 2029

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2035/1037
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A multi-chambered deposition pin wash station is provided. The wash station includes a lower chamber and an upper drain basin connected by a plurality of wash tubes. Cleaning fluid is provided to the lower chamber and passes through the cleaning tubes into the upper drain basin. The cleaning tubes are adapted to clean a single deposition pin with a single tube per wash cycle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.