Patent · US Active

Inductively coupled plasma processing apparatus

US8021515B2 · kind B2 · utility

2Cited by

7References

19Claims

0Family size

Assignee

THE EUROPEAN COMMUNITY, REPRESENTED BY THE EUROPEAN COMMISSION · BE

Inventors

Pascal Colpo · Borgomanero, IT
François Rossi · Varese, IT
Reinhard Fendler · Radebeul, DE

Key dates

Filing date	Nov 22, 2005
Grant date	Sep 20, 2011
Priority date	—
Expiry date	Jul 28, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32458
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The dielectric window (400) has an external and an internal side with respect to the chamber (12). An electromagnetic field source (140) is arranged in front of the external side of the dielectric window (400) for generating an electromagnetic field within the plasma chamber (12). The field source comprises at least one magnetic core (301, 302, 303). The at least one magnetic core (301, 302, 303) is attached to the external side of the dielectric window (400), such that the at least one magnetic core helps the dielectric window (400) to withstand collapsing forces caused by negative pressure inside said chamber during operation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.