Method for producing a radiation-absorbing optical element and corresponding radiation absorbing optical element

US8021560B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Norbert Kaiser · Markt Taschendorf, DE
• Antje Kaless · Jena, DE
• Peter Munzert · Jena, DE
• Michael Scheler · Jena, DE
• Ulrike Schulz · Jena, DE

Key dates

• Filing date: Sep 8, 2005
• Grant date: Sep 20, 2011
• Expiry date: Jun 7, 2028

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31678
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

In a process for the fabrication of a radiation-absorbing optical element that contains a substrate (1) of plastic, a layer with a graduated refractive index (4) is fabricated on at least one surface (2) of the substrate (1) using a plasma etching process, after which a metal layer (7) is applied on top of the layer with a graduated refractive index (4).