Low thermal expansion glass for EUVL applications
US8021755B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2010 |
| Grant date | Sep 20, 2011 |
| Priority date | — |
| Expiry date | Aug 25, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2495
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A low thermal expansion glass includes a base glass material having a front surface, a back surface, and a thickness and a glass coating material applied on at least the front surface of the base glass material. The base glass material consists essentially 10 wt % to 20 wt % titania and 80 wt % to 90 wt % silica. The glass coating material also consists essentially of titania and silica, but the total amount of titania in the glass coating material is lower than the total amount of titania in the base glass material. A silica-titania glass element suitable for extreme ultraviolet lithography applications consists of 12 wt % to 20 wt % titania and 80 wt % to 88 wt % silica and has a coefficient of thermal expansion of essentially 0 ΔL/L in a temperature range of −20° C. to +100° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.