Polymeric film with low blocking and high slip properties
US8021760B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 4, 2010 |
| Grant date | Sep 20, 2011 |
| Priority date | — |
| Expiry date | Feb 4, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31913
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film includes first and second outer layers, a core layer, and first and second substrate layers, each layer including a polymer; at least one of the substrate layers includes an amidic wax, and at least one of the outer layers includes an amidic wax present in an amount of 1% to 50% of the amount of wax in the first and second substrate layers respectively. The wax can be blended with a transition metal salt of stearic acid, or ester of stearic acid. Alternatively, a film includes first and second outer layers, and a substrate layer, each layer including a polymer; at least one of the first outer layer, second outer layer, and substrate layer including a blend of an amidic wax, and a transition metal salt of stearic acid, or ester of stearic acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.