Lithographic pellicle
US8026023B2 · kind B2 · utility
9Cited by
3References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 31, 2009 |
| Grant date | Sep 27, 2011 |
| Priority date | — |
| Expiry date | Sep 10, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic pellicle is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate adhesive provided on the other end face, wherein corners formed between a pellicle film adhesion face and exposure master plate adhesion face of the pellicle frame and inside and outside faces of the frame are subjected to C chamfering, and the chamfer dimension on the exposure master plate adhesion face is greater than C0.35 (mm) but no greater than C0.55 (mm).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.